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Business

Business

Hansol IONES ultra-precision coating technology improves yields
and productivity such as stabilizing parts and atmosphere
and extending the life of parts through coating of parts
used in Plasma Chamber during semiconductor and display
Major coating technologies include APS, SPS, DLC, INC, etc.

Coating 사업소개 배경
Coating LIFE TIME 연장, 공정수율향상, 생산성 극대화 이미지
Extend LIFE TIME

Reduce part One-Out and increase durability

Part Life Time Management through Part History Management

Maximize productivity

Reduce Backup Time

Equipment Condition Stable Management

Improving Process Yield

Particle Reduction

Arcing Zero with Special Coating

BELLJAR
  • Before coating

    Before coating

  • After coating

    After coating

CERAMIC DOME
  • Before coating

    Before coating

  • After coating

    After coating

COVER BELLOWS
  • Before coating

    Before coating

  • After coating

    After coating

DEPO SHIELD UPPER
  • Before coating

    Before coating

  • After coating

    After coating

EPD WINDOW
  • Before coating

    Before coating

  • After coating

    After coating

Coating Technology

Coating Type
Items PVD
(Physical Vaper Deposition)
ALD
(Atomic Layer Deposition)
APS
(Atmosphere Plasma Spray)
Description A process in which material is melted under high vacuum using an electron beam, then accelerated and deposited onto a substrate through plasma ionization. A technology that injects precursors alternately, enabling self-limiting surface reactions for ultra-thin, uniform, and dense films at an atomic scale. A method where raw materials are melted and sprayed onto substrates using high-temperature plasma in atmospheric conditions.
Key Benefits Achieves high-density, high-hardness thin films to minimize particle generation. Provides 3D conformal coatings, pinhole-free films, and excellent plasma resistance. Offers excellent plasma resistance for semiconductor parts, minimizing particle generation and stabilizing processes.
Cross section Cross section Image 1 Cross section Image 2 Cross section Image 3
Hardness [Hv] Y2O3(1100)
YAG(1500)
Al2O3(1500)
Y2O3(1100)
YAG(1100)
Al2O3(1200)
> 450
Porosity [%] < 0.01 < 0.01 < 1.5
Items SPS
(Suspension Plasma Spray)
INC
(Hansol IONES Nano Coating)
DLC
(Dual Layer Coating)
Description A coating technology that disperses fine
ceramic powders into a liquid slurry and sprays them using plasma.
A coating technology that forms a dense coating layer by accelerating ceramic powders at supersonic speeds onto the substrate under low vacuum at room temperature. A technology that forms a dense INC layer on the surface of APS-coated substrates.
Key Benefits Enhances the mechanical properties of the coating and improves the surface particle condition. Minimizes surface particle generation. Improves coating surface density and reduces surface particles.
Cross section Cross section Image 1 Cross section Image 2 Cross section Image 3
Hardness [Hv] 450~550 300~500 300~400
Porosity [%] < 1.0 < 0.5 < 0.5
APS Coating Details
Items APS
(Atmosphere Plasma Spray)
Y2O3 YOF SPC PRC PIC
Description A coating technology that melts and sprays ceramic powders such as Y2O3, Al2O3, YAG using an arc plasma heat source to form a solid coating layer.
Key Benefits Excellent plasma resistance Reduces back-up time and controls changes over time Improves coating surface roughness, hardness, and porosity Enhanced resistance to F and CI ion plasma atmospheres Reduces particle generation
Cross section Cross section Image 1 Cross section Image 2 Cross section Image 3 Cross section Image 4 Cross section Image 5
Hardness [Hv] 400~500 350~450 450~550 450~550 500~600
Porosity [%] < 3.0 < 3.0 < 1.5 < 2.0 < 3.0
Surface Treatment Technology
Items Fluorine Surface Treatment Plasma Cleaning
Description A technology that applies fluorine plasma treatment to the surfaces of materials such as Y2O3, Al2O3,YAG, anodized layers, Ni, and Al to form a fluorine compound layer. A technology that utilizes oxygen (O2) and fluorine (F) plasma to remove organic and inorganic contaminants from the surfaces of semiconductor parts, enabling their reuse.
Key Applications Reduction of back-up time for coated parts Cleaning and recycling of quartz, aluminum, and ceramic parts used in semiconductor processes.
Performance Reduction of surface roughness
Surface fluorine atomic percentage: 20–70%
Removal of surface contaminants (such as carbon and oxides) Extended lifespan through parts recycling Suppression of particle generation
Key Benefits Improving customer productivity by reducing back-up time Reducing material costs through parts recycling Lowering customer operating expenses and improving productivity
Benefits Cross section Image 1 Cross section Image 1